The Air Quality and Emissions Show 2017
The 9th in the series of Air Quality & Emissions Events will focus on industrial emissions and stack monitoring of (Part A) processes regulated by the Environment Agency, ambient air quality monitoring,the emissions to air of Part A2 and Part B processes controlled by local authorities, MCERTS standards, aspects of air quality protection and treatment.
Event organiser Marcus Pattison states "The need to produce accurate, reliable emissions monitoring data is the same whatever the industrial process," he says. "Furthermore, the technologies are invariably the same and the people responsible for emissions are often also responsible for all aspects of environmental monitoring, including workplace monitoring, ambient monitoring, leak detection, fugitive emissions, fence line monitoring, air treatment etc. It therefore makes sense for all of this to be brought together under one umbrella at the AQE SHOW."
Emissions monitoring will remain a central theme for the event, with the addition of other applications for gas and particulate monitoring this will substantially increase the scope and size of the event. For example, whilst the previous MCERTS events addressed the needs of those affected by the Environmental Permitting Regulations (large and/or complex industrial processes), AQE 2017 will also meet the needs of Local Authorities for ambient monitoring and for the many thousands of industrial processes that Local Authorities inspect and authorise.
The Air Quality and Emissions event will host packed Conference and Workshop programme to accompany the international Exhibition.
Topics covered in the 2017 event will include:
Ambient Monitoring, CEMS, Dioxin Monitoring, Mcerts, Regulation, Medium Combustion Plant Directive, Calibration, Air Treatment, Discontinuous Monitoring, Gas Analysis, Odour Monitoring & Treatment, Data Acquisition, Workplace Monitoring, Fence Line Monitoring, Manual Stack Monitoring, Abatement Technologies, Fugitive Emissions, and Operator Monitoring Assessment.